RF Sputter-Deposited Nanostructured CuO Films for Micro-Supercapacitors
نویسندگان
چکیده
Copper oxide is considered as an alternative electrode material for supercapacitors due to its low cost, chemical stability and high theoretical specific capacitance. In the present work, nanostructured copper (CuO) films are prepared by radio-frequency (RF) magnetron sputtering, influence of substrate temperature on microstructure supercapacitive properties was studied. The at 350 °C exhibit a predominant (1¯11) orientation corresponding monoclinic Cu(II)O phase with crystallite size 24 nm. surface film consists uniformly distributed oval-like grains providing roughness 45 optical bandgap 1.68 ± 0.01 eV electrical conductivity 0.4 S cm−1 room temperature. as-prepared CuO deliver discharge capacitance 387 mF cm−2 (375 F g−1) current density 1 mA excellent cyclic retention 95% (367 cm−2) even after 1000 cycles. Hence, these potential electrodes micro-supercapacitors.
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ژورنال
عنوان ژورنال: Applied nano
سال: 2021
ISSN: ['2673-3501']
DOI: https://doi.org/10.3390/applnano2010005